Vićentijević, M., Jakšić, M. & Suligoj, T. (2023). Implantation site design for large area diamond quantum device fabrication [Data set]. doi:10.1038/s41598-023-40785-3
Vićentijević, Milan, et al. Implantation site design for large area diamond quantum device fabrication. Institut Ruđer Bošković, 2023. 07 Dec 2024. doi:10.1038/s41598-023-40785-3
Vićentijević, Milan, Milko Jakšić, and Tomislav Suligoj. 2023. Implantation site design for large area diamond quantum device fabrication. Institut Ruđer Bošković. doi:10.1038/s41598-023-40785-3
Vićentijević, M., Jakšić, M. and Suligoj, T. 2023. Implantation site design for large area diamond quantum device fabrication. Institut Ruđer Bošković. [Online]. [Accessed 07 December 2024]. Available from: https://doi.org/10.1038/s41598-023-40785-3
Vićentijević M, Jakšić M, Suligoj T. Implantation site design for large area diamond quantum device fabrication. [Internet]. Institut Ruđer Bošković; 2023, [cited 2024 December 07] Available from: https://doi.org/10.1038/s41598-023-40785-3
M. Vićentijević, M. Jakšić and T. Suligoj, Implantation site design for large area diamond quantum device fabrication, Institut Ruđer Bošković, 2023. Accessed on: Dec 07, 2024. Available: https://doi.org/10.1038/s41598-023-40785-3
Title (english)
Implantation site design for large area diamond quantum device fabrication
With the number of qubits increasing with each new quantum processor design, it is to be expected that the area of the future quantum devices will become larger. As diamond is one of the promising materials for solid state quantum devices fabricated by ion implantation, we developed a single board diamond detector/preamplifier implantation system to serve as a testbed for implantation sites of different areas and geometry. We determined that for simple circular openings in a detector electrode, the uniformity of detection of the impinging ions increases as the area of the sites decreases. By altering the implantation site design and introducing lateral electric field, we were able to increase the area of the implantation site by an order of magnitude, without decreasing the detection uniformity. Successful detection of 140 keV copper ions that penetrate on average under 100 nm was demonstrated, over the 800 µm2 area implantation site (large enough to accommodate over 2 × 105 possible qubits), with 100% detection efficiency. The readout electronics of the implantation system were calibrated by a referent 241Am gamma source, achieving an equivalent noise charge value of 48 electrons, at room temperature, less than 1% of the energy of impinging ions.
Number: 824096 Title (english): Research And Development with Ion Beams – Advancing Technology in Europe Acronym: RADIATE Jurisdiction: eu Funding stream: H2020
Project
Number: 633053 Title (english): Implementation of activities described in the Roadmap to Fusion during Horizon 2020 through a Joint programme of the members of the EUROfusion consortium Acronym: EUROfusion Jurisdiction: eu Funding stream: H2020